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Standard [WITHDRAWN]

DIN 50453-2:1990-10

Testing of materials for semiconductor technology; determination of etch rates of etching mixtures; silicium-dioxid coating; optical method

German title
Prüfung von Materialien für die Halbleitertechnologie; Bestimmung der Ätzrate von Ätzmischungen; Siliciumdioxid-Schichten; Optisches Verfahren
Publication date
1990-10
Original language
German
Pages
2

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Publication date
1990-10
Original language
German
Pages
2
DOI
https://dx.doi.org/10.31030/2380725

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ICS
29.045
DOI
https://dx.doi.org/10.31030/2380725
Replacement amendments

This document has been replaced by: DIN 50453-2:2023-08 .

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