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Standard [CURRENT]

OVE EN 62047-25:2017-05-01

Semiconductor devices - Micro-electromechanical devices - Part 25: Silicon based MEMS fabrication technology - Measurement method of pull-press and shearing strength of micro bonding area (IEC 62047-25:2016) (german version)

German title
Halbleiterbauelemente - Bauelemente der Mikrosystemtechnik - Teil 25: Siliziumbasierte MEMS-Herstellungstechnologie - Messverfahren zur Zug-Druck- und Scherfestigkeit gebondeter Flächen im Mikrometerbereich (IEC 62047-25:2016) (deutsche Fassung)
Publication date
2017-05-01
Original language
German
Pages
24

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Publication date
2017-05-01
Original language
German
Pages
24

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