Determination of cobalt, chromium, copper, iron and nickel as impurities in hydrofluoric acid for use in semiconductor technology by plasma-induced emission spectrometry
German title
Prüfung von Materialien für die Halbleitertechnologie; Bestimmung von Metallspuren in Flüssigkeiten; Kobalt (Co), Chrom (Cr), Kupfer (Cu), Eisen (Fe) und Nickel (Ni) in Flußsäure mittels Plasma-angeregter Emissionsspektrometrie
Publication date
1990-10
Original language
German
Pages
2
Publication date
1990-10
Original language
German
Pages
2
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