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Standard [CURRENT]

DIN 50453-2:2023-08

Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 2: Silicon-dioxide coating, optical method

German title
Prüfung von Materialien für die Halbleitertechnologie - Bestimmung der Ätzrate von Ätzmischungen - Teil 2: Siliciumdioxid-Schichten, Optisches Verfahren
Publication date
2023-08
Original language
German
Pages
9

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Publication date
2023-08
Original language
German
Pages
9
DOI
https://dx.doi.org/10.31030/3434121

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Content
ICS
29.045
DOI
https://dx.doi.org/10.31030/3434121
Replacement amendments

This document replaces DIN 50453-2:1990-10 .

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