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Standard [CURRENT]

DIN 50455-1:2009-10

Testing of materials for semiconductor technology - Methods for characterizing photoresists - Part 1: Determination of coating thickness with optical methods

German title
Prüfung von Materialien für die Halbleitertechnologie - Verfahren zur Charakterisierung von Fotolacken - Teil 1: Bestimmung der Schichtdicke mit optischen Messverfahren
Publication date
2009-10
Original language
German
Pages
8

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Publication date
2009-10
Original language
German
Pages
8
DOI
https://dx.doi.org/10.31030/1534909

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Content
ICS
29.045
DOI
https://dx.doi.org/10.31030/1534909
Replacement amendments

This document replaces DIN 50455-1:1991-06 .

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