We use cookies to make our websites more user-friendly and to continuously improve them. If you continue to use the website, you consent to the use of cookies. You can find more information in our privacy statement and our cookie guidelines.

To our valued customers,

At last: 

Beuth Verlag is now DIN Media. 

You can find out more about our new name and the reasons behind it here.

To use our new website without any hiccups, please clear your browser cache. 

Yours sincerely,

DIN Media

Standards Worldwide
Standards Worldwide
Phone +49 30 58885700-07

Draft standard [WITHDRAWN]

DIN 50453-2:2023-02 - Draft

Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 2: Silicium-dioxid coating, optical method

German title
Prüfung von Materialien für die Halbleitertechnologie - Bestimmung der Ätzrate von Ätzmischungen - Teil 2: Siliciumdioxid-Schichten, Optisches Verfahren
Date of issue
2023-01-06
Publication date
2023-02
Original language
German
Pages
8

Please select

from 42.10 EUR VAT included

from 39.35 EUR VAT excluded

Purchasing options

PDF download 1

  • 42.10 EUR

Shipment (3-5 working days) 1

  • 51.00 EUR

1

 Attention: Document withdrawn!

Date of issue
2023-01-06
Publication date
2023-02
Original language
German
Pages
8
DOI
https://dx.doi.org/10.31030/3400900

Product information on this site:

Quick delivery via download or delivery service

Buy securely with a credit card or pay upon receipt of invoice

All transactions are encrypted

Content
ICS
29.045
DOI
https://dx.doi.org/10.31030/3400900
Replacement amendments

This document has been replaced by: DIN 50453-2:2023-08 .

Cooperation at DIN

Loading recommended items...
Loading recommended items...
Loading recommended items...
Loading recommended items...